Ultra thin oxide grown on polysilicon by ECR(Electron Cyclotron Resonance) N2O Plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hyung-Cheol Shin | - |
| dc.date.accessioned | 2013-03-16T00:14:16Z | - |
| dc.date.available | 2013-03-16T00:14:16Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2000 | - |
| dc.identifier.citation | 5th International Symposium on Plasma Process-Induced Damage 2000, v., no.2000, pp.133 - 136 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/125454 | - |
| dc.language | ENG | - |
| dc.title | Ultra thin oxide grown on polysilicon by ECR(Electron Cyclotron Resonance) N2O Plasma | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.issue | 2000 | - |
| dc.citation.beginningpage | 133 | - |
| dc.citation.endingpage | 136 | - |
| dc.citation.publicationname | 5th International Symposium on Plasma Process-Induced Damage 2000 | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Hyung-Cheol Shin | - |
- Appears in Collection
- RIMS Conference Papers
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.