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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

The Applicability of SiFxNy Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography

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dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorBae, Byeong-Soo-
dc.contributor.authorJun, BH-
dc.contributor.authorHan, SS-
dc.contributor.authorKim, DW-
dc.contributor.authorKang, HY-
dc.contributor.authorKoh, YB-
dc.date.accessioned2013-03-15T21:00:40Z-
dc.date.available2013-03-15T21:00:40Z-
dc.date.created2012-02-06-
dc.date.issued1996-01-01-
dc.identifier.citationMRS Symp. Proc., v., no., pp.115 - 120-
dc.identifier.urihttp://hdl.handle.net/10203/123830-
dc.languageENG-
dc.publisherMaterials Research Society-
dc.titleThe Applicability of SiFxNy Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage115-
dc.citation.endingpage120-
dc.citation.publicationnameMRS Symp. Proc.-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorJun, BH-
dc.contributor.nonIdAuthorHan, SS-
dc.contributor.nonIdAuthorKim, DW-
dc.contributor.nonIdAuthorKang, HY-
dc.contributor.nonIdAuthorKoh, YB-
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MS-Conference Papers(학술회의논문)MS-Conference Papers(학술회의논문)
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