Excimer Laser Photoresists Using Alicyclic Matrix Polymers

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dc.contributor.authorKim, Jin-Baek-
dc.contributor.authorJung, Min Ho-
dc.contributor.authorKim, Hyun-Woo-
dc.contributor.authorChun, Sung-Deuk-
dc.date.accessioned2013-03-15T19:08:37Z-
dc.date.available2013-03-15T19:08:37Z-
dc.date.created2012-02-06-
dc.date.issued1996-08-04-
dc.identifier.citation36th IUPAC International Symposium on Macromolecules, v., no., pp.461 - 461-
dc.identifier.urihttp://hdl.handle.net/10203/122804-
dc.languageENG-
dc.titleExcimer Laser Photoresists Using Alicyclic Matrix Polymers-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage461-
dc.citation.endingpage461-
dc.citation.publicationname36th IUPAC International Symposium on Macromolecules-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorJung, Min Ho-
dc.contributor.nonIdAuthorKim, Hyun-Woo-
dc.contributor.nonIdAuthorChun, Sung-Deuk-
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CH-Conference Papers(학술회의논문)
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