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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Journal Papers(저널논문)

Patterning Si by using surface functionalization and microcontact printing with a polymeric ink

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dc.contributor.authorLee, KBko
dc.contributor.authorKim, DJko
dc.contributor.authorYoon, KRko
dc.contributor.authorKim, Yko
dc.contributor.authorChoi, Insungko
dc.date.accessioned2009-11-05T02:55:17Z-
dc.date.available2009-11-05T02:55:17Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2003-09-
dc.identifier.citationKOREAN JOURNAL OF CHEMICAL ENGINEERING, v.20, no.5, pp.956 - 959-
dc.identifier.issn0256-1115-
dc.identifier.urihttp://hdl.handle.net/10203/12166-
dc.description.abstractThis paper describes a simple procedure for patterning Si substrate using a combination of surface functionalization and microcontact printing (muCP). The Si/SiO2 surfaces were chemically modified to present self-assembled monolayer (SAMs) of siloxanes terminating in reactive carboxylic anhydride groups and then patterned with poly(ethylene imine) (PEI) by muCP. We used the patterned thin films of PEI as etch resists on Si surfaces.-
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherKOREAN INST CHEM ENGINEERS-
dc.subjectSELF-ASSEMBLED MONOLAYERS-
dc.subjectETCH RESISTS-
dc.subjectGOLD-
dc.subjectMICROFABRICATION-
dc.subjectOXIDE-
dc.titlePatterning Si by using surface functionalization and microcontact printing with a polymeric ink-
dc.typeArticle-
dc.identifier.wosid000185753500028-
dc.identifier.scopusid2-s2.0-0344961210-
dc.type.rimsART-
dc.citation.volume20-
dc.citation.issue5-
dc.citation.beginningpage956-
dc.citation.endingpage959-
dc.citation.publicationnameKOREAN JOURNAL OF CHEMICAL ENGINEERING-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorChoi, Insung-
dc.contributor.nonIdAuthorLee, KB-
dc.contributor.nonIdAuthorKim, DJ-
dc.contributor.nonIdAuthorYoon, KR-
dc.contributor.nonIdAuthorKim, Y-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorpattem generation-
dc.subject.keywordAuthormicrocontact printing (mu CP)-
dc.subject.keywordAuthorself-assembled monolayers (SAMs)-
dc.subject.keywordAuthorSi etching-
dc.subject.keywordPlusSELF-ASSEMBLED MONOLAYERS-
dc.subject.keywordPlusETCH RESISTS-
dc.subject.keywordPlusGOLD-
dc.subject.keywordPlusMICROFABRICATION-
dc.subject.keywordPlusOXIDE-
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