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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Chromium Aluminim Oxide Phase-Shifting Mask Material for 193nm Lithography

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dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorKim, Eun Ah-
dc.contributor.authorHong, Seung Bum-
dc.contributor.authorMoon, Seong-Yong-
dc.date.accessioned2013-03-15T14:42:34Z-
dc.date.available2013-03-15T14:42:34Z-
dc.date.created2012-02-06-
dc.date.issued1997-
dc.identifier.citationThird International Symposium on 193nm Lithography, v., no., pp.127 --
dc.identifier.urihttp://hdl.handle.net/10203/120378-
dc.languageENG-
dc.titleChromium Aluminim Oxide Phase-Shifting Mask Material for 193nm Lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage127-
dc.citation.publicationnameThird International Symposium on 193nm Lithography-
dc.identifier.conferencecountryJapan-
dc.identifier.conferencecountryJapan-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorKim, Eun Ah-
dc.contributor.nonIdAuthorHong, Seung Bum-
dc.contributor.nonIdAuthorMoon, Seong-Yong-
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MS-Conference Papers(학술회의논문)
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