Enhancement of Gas Flow Symmetry in the ICP Oxide Etcher
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정원영 | - |
| dc.contributor.author | 김도현 | - |
| dc.date.accessioned | 2013-03-15T13:02:08Z | - |
| dc.date.available | 2013-03-15T13:02:08Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996-10 | - |
| dc.identifier.citation | 한국화학공학회 추계학술발표회, v.2, no.2, pp.2507 - 2510 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/119685 | - |
| dc.language | KOR | - |
| dc.title | Enhancement of Gas Flow Symmetry in the ICP Oxide Etcher | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.volume | 2 | - |
| dc.citation.issue | 2 | - |
| dc.citation.beginningpage | 2507 | - |
| dc.citation.endingpage | 2510 | - |
| dc.citation.publicationname | 한국화학공학회 추계학술발표회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 김도현 | - |
| dc.contributor.nonIdAuthor | 정원영 | - |
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