Plama Etching of Copper Films Using Ultra Violet Radiation
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chul-Hi Han | - |
| dc.date.accessioned | 2013-03-15T11:31:33Z | - |
| dc.date.available | 2013-03-15T11:31:33Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1997 | - |
| dc.identifier.citation | The International Conference on Solid State Devices and Materials, v., no., pp.300 - 301 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/119120 | - |
| dc.language | ENG | - |
| dc.title | Plama Etching of Copper Films Using Ultra Violet Radiation | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 300 | - |
| dc.citation.endingpage | 301 | - |
| dc.citation.publicationname | The International Conference on Solid State Devices and Materials | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Chul-Hi Han | - |
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