Prearation and characterizationof (Sr1-xTix)O3 and (Ba1-xSrx)TiO3 thin Films Using ECR Plasma Assiated MOCVD
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | No, Kwangsoo | - |
| dc.date.accessioned | 2013-03-15T11:05:48Z | - |
| dc.date.available | 2013-03-15T11:05:48Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996-01-01 | - |
| dc.identifier.citation | Material Research Society Symposium Proc., v., no., pp.9 - 20 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/118871 | - |
| dc.language | ENG | - |
| dc.publisher | MRS | - |
| dc.title | Prearation and characterizationof (Sr1-xTix)O3 and (Ba1-xSrx)TiO3 thin Films Using ECR Plasma Assiated MOCVD | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 9 | - |
| dc.citation.endingpage | 20 | - |
| dc.citation.publicationname | Material Research Society Symposium Proc. | - |
| dc.contributor.localauthor | No, Kwangsoo | - |
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