Influence of hydrogen addition on the chemical properties of hydrogenated aluminum nitride films prepared by rf reactive sputtering

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dc.contributor.authorLee, Jai Young-
dc.contributor.authorYong Y.-J.-
dc.date.accessioned2013-03-15T10:58:41Z-
dc.date.available2013-03-15T10:58:41Z-
dc.date.created2012-02-06-
dc.date.issued1996-12-02-
dc.identifier.citationProceedings of the 1996 MRS Fall Symposium, v.449, no., pp.999 - 1004-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/10203/118832-
dc.languageENG-
dc.titleInfluence of hydrogen addition on the chemical properties of hydrogenated aluminum nitride films prepared by rf reactive sputtering-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0030713470-
dc.type.rimsCONF-
dc.citation.volume449-
dc.citation.beginningpage999-
dc.citation.endingpage1004-
dc.citation.publicationnameProceedings of the 1996 MRS Fall Symposium-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorLee, Jai Young-
dc.contributor.nonIdAuthorYong Y.-J.-
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NE-Conference Papers(학술회의논문)
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