Effects of the addition of CF4, Cl2, and N2 to O2 ECR plasma on the etch rate, selectivity, and etched profile of RuO2 film
- Issue Date
- 1997-11-30
- Language
- ENG
- Citation
Proceedings of the 1997 MRS Fall Symposium, v.493, pp.183 - 188
- ISSN
- 0272-9172
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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