DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Eun Ah | - |
dc.contributor.author | Hong, Seung Bum | - |
dc.contributor.author | Jiang, Zhong-Tao | - |
dc.contributor.author | Lim, Sung C | - |
dc.contributor.author | Woo, Sang-Gyun | - |
dc.contributor.author | Koh, Young-Bum | - |
dc.contributor.author | No, Kwangsoo | - |
dc.date.accessioned | 2013-03-15T09:05:33Z | - |
dc.date.available | 2013-03-15T09:05:33Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997-04-17 | - |
dc.identifier.citation | Photomask and X-Ray Mask Technology IV, v.3096, no., pp.294 - 297 | - |
dc.identifier.uri | http://hdl.handle.net/10203/118109 | - |
dc.language | ENG | - |
dc.title | Stability of CrFx films for phase-shifting mask | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0031356950 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 3096 | - |
dc.citation.beginningpage | 294 | - |
dc.citation.endingpage | 297 | - |
dc.citation.publicationname | Photomask and X-Ray Mask Technology IV | - |
dc.identifier.conferencecountry | Japan | - |
dc.identifier.conferencecountry | Japan | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Kim, Eun Ah | - |
dc.contributor.nonIdAuthor | Hong, Seung Bum | - |
dc.contributor.nonIdAuthor | Jiang, Zhong-Tao | - |
dc.contributor.nonIdAuthor | Lim, Sung C | - |
dc.contributor.nonIdAuthor | Woo, Sang-Gyun | - |
dc.contributor.nonIdAuthor | Koh, Young-Bum | - |
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