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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

The Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet LithographyThe Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography

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dc.contributor.authorBae, Byeong-Soo-
dc.contributor.authorNo, Kwangsoo-
dc.contributor.authorJun, BH-
dc.contributor.authorHan, SS-
dc.contributor.authorKim, DW-
dc.contributor.authorKang, HY-
dc.contributor.authorKoh, YB-
dc.date.accessioned2013-03-15T07:27:12Z-
dc.date.available2013-03-15T07:27:12Z-
dc.date.created2012-02-06-
dc.date.issued1997-
dc.identifier.citationMRS Symposium, v.446, no., pp.115 - 120-
dc.identifier.urihttp://hdl.handle.net/10203/117372-
dc.languageENG-
dc.publisherMRS-
dc.titleThe Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography-
dc.title.alternativeThe Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.volume446-
dc.citation.beginningpage115-
dc.citation.endingpage120-
dc.citation.publicationnameMRS Symposium-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorJun, BH-
dc.contributor.nonIdAuthorHan, SS-
dc.contributor.nonIdAuthorKim, DW-
dc.contributor.nonIdAuthorKang, HY-
dc.contributor.nonIdAuthorKoh, YB-
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MS-Conference Papers(학술회의논문)MS-Conference Papers(학술회의논문)
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