Effect of process conditions on the removal of native oxide in wafer cleaning process employing UV excited NF3/H2
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 권성구 | - |
| dc.contributor.author | 김도현 | - |
| dc.date.accessioned | 2013-03-15T06:20:38Z | - |
| dc.date.available | 2013-03-15T06:20:38Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996-11 | - |
| dc.identifier.citation | KMRS Fall Symposium, v., no., pp.152 - 153 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/116956 | - |
| dc.language | KOR | - |
| dc.title | Effect of process conditions on the removal of native oxide in wafer cleaning process employing UV excited NF3/H2 | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 152 | - |
| dc.citation.endingpage | 153 | - |
| dc.citation.publicationname | KMRS Fall Symposium | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 김도현 | - |
| dc.contributor.nonIdAuthor | 권성구 | - |
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