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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Journal Papers(저널논문)

Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)]

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dc.contributor.authorKim, Jin-Baekko
dc.contributor.authorKo, JSko
dc.contributor.authorChoi, JHko
dc.contributor.authorJang, JHko
dc.contributor.authorOh, THko
dc.contributor.authorKim, HWko
dc.contributor.authorLee, BWko
dc.date.accessioned2009-09-24T08:51:54Z-
dc.date.available2009-09-24T08:51:54Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-07-
dc.identifier.citationPOLYMER, v.45, no.16, pp.5397 - 5401-
dc.identifier.issn0032-3861-
dc.identifier.urihttp://hdl.handle.net/10203/11503-
dc.description.abstractPoly [(methacrylic acid tert-butyl cholate ester)-co-(gamma-butyrolactone-2-yl methacrylate)] was synthesized and evaluated as a new 193-nm chemically amplified photoresist. This polymer showed good thermal stability up to 240 degreesC and had a good transmittance at 193 nm. This material showed good resistance to CF4-reactive ion etching. The resist patterns of 0.15 mum feature size were obtained at a dose of 11 mJ cm(-2) using an argon fluoride excimer laser stepper. (C) 2004 Published by Elsevier Ltd.-
dc.description.sponsorshipKAIST BK21en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherELSEVIER SCI LTD-
dc.subjectNORBORNENE COPOLYMERS-
dc.subjectARF LITHOGRAPHY-
dc.subjectDERIVATIVES-
dc.subjectRESIST-
dc.titleSynthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)]-
dc.typeArticle-
dc.identifier.wosid000222927700003-
dc.identifier.scopusid2-s2.0-4143129847-
dc.type.rimsART-
dc.citation.volume45-
dc.citation.issue16-
dc.citation.beginningpage5397-
dc.citation.endingpage5401-
dc.citation.publicationnamePOLYMER-
dc.identifier.doi10.1016/j.polymer.2004.05.041-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorKo, JS-
dc.contributor.nonIdAuthorChoi, JH-
dc.contributor.nonIdAuthorJang, JH-
dc.contributor.nonIdAuthorOh, TH-
dc.contributor.nonIdAuthorKim, HW-
dc.contributor.nonIdAuthorLee, BW-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorArF lithography-
dc.subject.keywordAuthormethacrylic acid tert-butyl cholate ester-
dc.subject.keywordAuthor-gamma-butyrolactone-2-yl methacrylate-
dc.subject.keywordPlusNORBORNENE COPOLYMERS-
dc.subject.keywordPlusARF LITHOGRAPHY-
dc.subject.keywordPlusDERIVATIVES-
dc.subject.keywordPlusRESIST-
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