DC Field | Value | Language |
---|---|---|
dc.contributor.author | Young-Gil, K | ko |
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Fujigaya, T | ko |
dc.contributor.author | Shibasaki, Y | ko |
dc.contributor.author | Ueda, M | ko |
dc.date.accessioned | 2009-09-24T08:18:08Z | - |
dc.date.available | 2009-09-24T08:18:08Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002 | - |
dc.identifier.citation | JOURNAL OF MATERIALS CHEMISTRY, v.12, no.1, pp.53 - 57 | - |
dc.identifier.issn | 0959-9428 | - |
dc.identifier.uri | http://hdl.handle.net/10203/11501 | - |
dc.description.abstract | A positive working low- molecular- weight photoresist based on partially t- Boc protected tetra- C-methylcalix[ 4] resorcinarene (t- Boc C- 4- R) and a photoacid generator (PAG), diphenyliodonium 9,10- dimethoxyanthracene- 2- sulfonate (DIAS) has been developed. t- Boc C- 4- Rs were prepared by the reaction of C- 4- R with di- tert- butyl dicarbonate in the presence of 4- dimethylaminopyridine (DMAP). A clear film cast from a 20 wt% t- Boc C- 4- R solution in cyclohexanone showed high transparency to UV above 300 nm. The appropriate t- Boc protecting ratio was about 60 mol% in view of adhesion, deprotection temperature and dissolution rate. The photoresist consisting of 60 mol% t- Boc C- 4- R (95 wt%) and DIAS (5 wt%) showed a sensitivity of 13 mJ cm(-2) and a contrast of 12.6 when it was exposed to 365 nm light and postbaked at 105 degreesC for 90 s, followed by developing with a 2.38 wt% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature. A fine positive image featuring 1.5 mum of minimum line and space patterns was observed on the film of the photoresist exposed to 40 mJ cm(-2) of UV- light at 365 nm by the contact mode. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.subject | CROSS-LINKER | - |
dc.subject | DISSOLUTION | - |
dc.title | A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator | - |
dc.type | Article | - |
dc.identifier.wosid | 000172665900011 | - |
dc.identifier.scopusid | 2-s2.0-0036147998 | - |
dc.type.rims | ART | - |
dc.citation.volume | 12 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 53 | - |
dc.citation.endingpage | 57 | - |
dc.citation.publicationname | JOURNAL OF MATERIALS CHEMISTRY | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Young-Gil, K | - |
dc.contributor.nonIdAuthor | Fujigaya, T | - |
dc.contributor.nonIdAuthor | Shibasaki, Y | - |
dc.contributor.nonIdAuthor | Ueda, M | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | CROSS-LINKER | - |
dc.subject.keywordPlus | DISSOLUTION | - |
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