DC Field | Value | Language |
---|---|---|
dc.contributor.author | Koh, JH | - |
dc.contributor.author | Woo, Seong-Ihl | - |
dc.date.accessioned | 2013-03-15T00:29:50Z | - |
dc.date.available | 2013-03-15T00:29:50Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1989 | - |
dc.identifier.citation | International Conference on VLSI and CAD, v., no., pp.248 - 251 | - |
dc.identifier.uri | http://hdl.handle.net/10203/115015 | - |
dc.language | ENG | - |
dc.title | Computer simulation of APCVD process for amorphous SiC thin film on silicon wafer | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 248 | - |
dc.citation.endingpage | 251 | - |
dc.citation.publicationname | International Conference on VLSI and CAD | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Woo, Seong-Ihl | - |
dc.contributor.nonIdAuthor | Koh, JH | - |
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