DSpace at KOASAS: Ion irradiated amorphous silicon: a model approach to dynamics of defect creation and annihilation

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College of Natural Sciences(자연과학대학)Graduate School of Nanoscience and Technology(나노과학기술대학원)NT-Conference Papers(학술회의논문)

Ion irradiated amorphous silicon: a model approach to dynamics of defect creation and annihilation

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Atwater, Harry A. / Shin, JungHoon researcher

Issue Date: 1993

Language: ENG

Citation: Materials Research Society

URI: http://hdl.handle.net/10203/114375

Appears in Collection: NT-Conference Papers(학술회의논문)

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