Suppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures

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dc.contributor.authorShin, JungHoon-
dc.contributor.authorIm, James S.-
dc.contributor.authorAtwater, Harry A.-
dc.date.accessioned2013-03-14T22:48:14Z-
dc.date.available2013-03-14T22:48:14Z-
dc.date.created2012-02-06-
dc.date.issued1991-
dc.identifier.citationMaterials Research Society, v., no., pp.357 - 362-
dc.identifier.urihttp://hdl.handle.net/10203/114206-
dc.languageENG-
dc.titleSuppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage357-
dc.citation.endingpage362-
dc.citation.publicationnameMaterials Research Society-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorShin, JungHoon-
dc.contributor.nonIdAuthorIm, James S.-
dc.contributor.nonIdAuthorAtwater, Harry A.-
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NT-Conference Papers(학술회의논문)
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