Suppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shin, JungHoon | - |
| dc.contributor.author | Im, James S. | - |
| dc.contributor.author | Atwater, Harry A. | - |
| dc.date.accessioned | 2013-03-14T22:48:14Z | - |
| dc.date.available | 2013-03-14T22:48:14Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991 | - |
| dc.identifier.citation | Materials Research Society, v., no., pp.357 - 362 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/114206 | - |
| dc.language | ENG | - |
| dc.title | Suppression of crystal nucleation in amorphous silicon thin films by high energy ion irradiation at intermediate temperatures | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 357 | - |
| dc.citation.endingpage | 362 | - |
| dc.citation.publicationname | Materials Research Society | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Shin, JungHoon | - |
| dc.contributor.nonIdAuthor | Im, James S. | - |
| dc.contributor.nonIdAuthor | Atwater, Harry A. | - |
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