In-Situ Characterization of Amorphous Silicon Films by Low Temperature Mult-Step Rapid Thermal Annealing Process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choochon Lee | - |
| dc.date.accessioned | 2013-03-14T22:25:27Z | - |
| dc.date.available | 2013-03-14T22:25:27Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991 | - |
| dc.identifier.citation | Proc.of Materials Research Society Spring Meeting, v., no., pp.347 - 352 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/113990 | - |
| dc.language | ENG | - |
| dc.title | In-Situ Characterization of Amorphous Silicon Films by Low Temperature Mult-Step Rapid Thermal Annealing Process | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 347 | - |
| dc.citation.endingpage | 352 | - |
| dc.citation.publicationname | Proc.of Materials Research Society Spring Meeting | - |
| dc.contributor.localauthor | Choochon Lee | - |
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