DC Field | Value | Language |
---|---|---|
dc.contributor.author | Seo, JM | ko |
dc.contributor.author | Kim, YK | ko |
dc.contributor.author | Lee, HG | ko |
dc.contributor.author | Chung, YS | ko |
dc.contributor.author | Kim, Sehun | ko |
dc.date.accessioned | 2009-09-21T02:51:43Z | - |
dc.date.available | 2009-09-21T02:51:43Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1996 | - |
dc.identifier.citation | JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.3, pp.941 - 945 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.uri | http://hdl.handle.net/10203/11354 | - |
dc.description.abstract | The effects of sulfur passivation on liquid-phase-epitaxy-grown n-type InGaP and AlGaAs surfaces have been studied using x-ray photoelectron spectroscopy. The surfaces were simultaneously prepared through degreasing and the use of an aqueous (NH4)(2)S-x treatment in air. For InGaP, sulfur atoms initially reacted with both surface In and Ga atoms and reacted negligibly with P atoms. The band bending was reduced by 0.7 eV compared to a sputter-cleaned surface. Presumably, sulfur eliminated P-vacancy-related gap states by occupying P sites and forming In-S and Ga-S bonds. By postheat treatment at 180 degrees C, S atoms were not removed from the surface and band bending was reduced further by 0.1 eV. For AlGaAs, S atoms initially reacted with Ga and As, but this treatment could not remove the Al oxide previously formed in the air. Postheat treatment at 180 degrees C simply induced S redistribution from As to Ga and As desorption, which reduced the band bending by 0.3 eV compared to the sputter-cleaned surface-a result similar to that for GaAs. (C) 1996 American Vacuum Society. | - |
dc.description.sponsorship | The present studies were supported by the Basic Science Research Institute program, Ministry of Education, 1994, Project No. BSRI-94-2433. One of us ~S. K.! has been supported by the Center for Molecular Science. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | BIPOLAR-TRANSISTOR | - |
dc.subject | OHMIC CONTACTS | - |
dc.subject | GAAS-SURFACES | - |
dc.subject | INP | - |
dc.title | Reduction of gap states of ternary III-V semiconductor surfaces by sulfur passivation: Comparative studies of AlGaAs and InGaP | - |
dc.type | Article | - |
dc.identifier.wosid | A1996UR13400052 | - |
dc.identifier.scopusid | 2-s2.0-0342850912 | - |
dc.type.rims | ART | - |
dc.citation.volume | 14 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 941 | - |
dc.citation.endingpage | 945 | - |
dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Sehun | - |
dc.contributor.nonIdAuthor | Seo, JM | - |
dc.contributor.nonIdAuthor | Kim, YK | - |
dc.contributor.nonIdAuthor | Lee, HG | - |
dc.contributor.nonIdAuthor | Chung, YS | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | BIPOLAR-TRANSISTOR | - |
dc.subject.keywordPlus | OHMIC CONTACTS | - |
dc.subject.keywordPlus | GAAS-SURFACES | - |
dc.subject.keywordPlus | INP | - |
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