The Electrical Properties of Thermal Annealed PECVD Silicon Nitride Films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Sang-Won Kang | - |
| dc.date.accessioned | 2013-03-14T16:48:57Z | - |
| dc.date.available | 2013-03-14T16:48:57Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1987 | - |
| dc.identifier.citation | Proc. of International Symp. on Trends and New Applications in Thin Films, v., no., pp.239 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/110928 | - |
| dc.language | ENG | - |
| dc.title | The Electrical Properties of Thermal Annealed PECVD Silicon Nitride Films | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 239 | - |
| dc.citation.publicationname | Proc. of International Symp. on Trends and New Applications in Thin Films | - |
| dc.identifier.conferencecountry | France | - |
| dc.identifier.conferencecountry | France | - |
| dc.contributor.localauthor | Sang-Won Kang | - |
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