The Effect of Reaction Condition on the Crystallographic Orientation and Surface Morphology of Chemical Vapor Deposited Al2O3

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dc.contributor.authorChun , Soung Soonko
dc.date.accessioned2013-03-14T16:11:47Z-
dc.date.available2013-03-14T16:11:47Z-
dc.date.created2012-02-06-
dc.date.issued1983-05-
dc.identifier.citationProc. EURO CVD 4, Chemical Vapor Deposition , pp.410-
dc.identifier.urihttp://hdl.handle.net/10203/110609-
dc.languageEnglish-
dc.publisherEuropean Conference on Chemical Vapour Deposition-
dc.titleThe Effect of Reaction Condition on the Crystallographic Orientation and Surface Morphology of Chemical Vapor Deposited Al2O3-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage410-
dc.citation.publicationnameProc. EURO CVD 4, Chemical Vapor Deposition-
dc.identifier.conferencecountryNE-
dc.identifier.conferencelocationEindhoven-
dc.contributor.localauthorChun , Soung Soon-
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