| 1 | A New Type of Eco-Friendly Resist Based on Nonchemically Amplified System Park, Ji Young; Yun, Je Moon; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.22, pp.7534 - 7542, 2008-11 |
| 2 | Direct electron-beam writing with high aspect ratio for fabricating ion-beam lithography mask Lee, BN; Cho, Yong-Hoon; Kim, YS; Hong, W; Woo, HJ, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, pp.S199 - S201, 2003-02 |
| 3 | Fabrication of nanodevice using individual single crystalline nanowire and their physical property measurements = 단결정 단일 나노선을 이용한 나노소자 제작과 특성에 관한 연구link Lee, Sung-hun; 이성훈; et al, 한국과학기술원, 2008 |
| 4 | Fabrication of versatile metal oxide nanostructures using hybrid organic-inorganic materials and their applications = 유무기 하이브리드 물질을 이용한 다양한 메탈 옥사이드 나노구조체 제작과 그 응용link Shin, Seungmin; 신승민; et al, 한국과학기술원, 2017 |
| 5 | High performance molecular resists based on beta-cyclodextrin Kwon, Younggil; Yun, Hyojin; Ganesan, Ramakrishnan; Kim, Jin-Baek; Choi, Jae-Hak, POLYMER JOURNAL, v.38, no.9, pp.996 - 998, 2006 |
| 6 | Mass Spectrometry Assisted Lithography for the Patterning of Cell Adhesion Ligands on Self-Assembled Monolayers Kim, Young-Kwan; Ryoo, Soo-Ryoon; Kwack, Sul-Jin; Min, Dal-Hee, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.48, no.19, pp.3507 - 3511, 2009 |
| 7 | Molecular and polymeric resists for deep UV lithography = Deep UV 리소그라피용 분자 및 고분자 레지스트에 관한 연구link Ganesan, Ramakrishnan; 가네산, 라마크리시난; et al, 한국과학기술원, 2006 |
| 8 | Nanosinusoidal Surface Zinc Oxide for Optical Out-coupling of Inverted Organic Light-Emitting Diodes Kim, Do-Hong; Woo, Kie Young; Han, Jun Hee; Lee, TaeWoo; Lee, Hoseung; Cho, Yong-Hoon; Choi, Kyung Cheol, ACS PHOTONICS, v.5, no.10, pp.4061 - 4067, 2018-10 |
| 9 | Non-shrinkable and nanomolecular resists for DUV lithography = 비수축성 레지스트와 나노분자 레지스트에 관한 연구link Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2006 |
| 10 | Novel photobleachable deep UV resists based on single component nonchemically amplified resist system Kim, Jin-Baek; Kim, KS, MACROMOLECULAR RAPID COMMUNICATIONS, v.26, no.17, pp.1412 - 1417, 2005-09 |
| 11 | Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist Ganesana, Ramakrishnan; Youna, Seul-Ki; Kim, Jin-Baek, MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.5, pp.437 - 441, 2008-03 |
| 12 | One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy Jeong, Seong-Jun; Moon, Hyoung-Seok; Shin, Jong-Hwa; Kim, Bong-Hoon; Shin, Dong-Ok; Kim, Ju-Young; Lee, Yong-Hee; et al, NANO LETTERS, v.10, no.9, pp.3500 - 3505, 2010-09 |
| 13 | One-Step Modification of Superhydrophobic Surfaces by a Mussel-Inspired Polymer Coating Kang, SM; You, I; Cho, WK; Shon, HK; Lee, TG; Choi, Insung; Karp, JM; et al, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.49, no.49, pp.9401 - 9404, 2010 |
| 14 | Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography Baruth, Andrew; Seo, Myungeun; Lin, Chun Hao; Walster, Kern; Shankar, Arjun; Hillmyer, Marc A.; Leighton, C, ACS APPLIED MATERIALS & INTERFACES, v.6, no.16, pp.13770 - 13781, 2014-08 |
| 15 | Polymeric and molecular resists for short wavelength lithography = 단파장 리소그라피용 고분자 및 분자 레지스트link Yun, Hyo-Jin; 윤효진; et al, 한국과학기술원, 2002 |
| 16 | Selective positioning of thermo curable materials using photolithography = 리소그래피를 이용한 열경화성 물질의 선택적 도포에 관한 연구link Cho, Young-Ook; 조영욱; et al, 한국과학기술원, 2013 |
| 17 | Synthesis of copolymers with diazo groups and their application as DUV resists = 다이아조기를 포함하는 고분자의 합성과 레지스트로서의 응용link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2005 |
| 18 | Synthesis of norbornene copolymers with β-keto ester groups and their application as photoresists = 베타-케토 에스테르기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 포토레지스트로서의 응용link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2001 |
