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Effects of a sheath boundary on electron energy distribution in Ar/He dc magnetron discharges Seo, SH; In, JH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.96, pp.57 - 64, 2004-07 |
Effects of substrate bias on electron energy distribution in magnetron sputtering system Seo, Sang-Hun; In, Jung-Hwan; Chang, Hong-Young; Han, Jeon-Geon, PHYSICS OF PLASMAS, v.11, no.10, pp.4796 - 4800, 2004-10 |
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