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Showing results 1 to 8 of 8

1
Diode laser-induced fluorescence measurements of metastable argon ions in a magnetized inductively coupled plasma

Jun, S; Chang, Hong-Young; McWilliams, R, PHYSICS OF PLASMAS, v.13, pp.122 - 123, 2006-05

2
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09

3
Electron temperature control with a small mesh number grid in inductively coupled plasmas

Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11

4
Electron temperature control with grid bias in inductively coupled argon plasma

Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03

5
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma

Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06

6
Plasma parameters analysis of various mixed gas inductively coupled plasmas

Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06

7
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07

8
The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature

Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03

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