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Showing results 1 to 3 of 3

1
Computational Characterization of a New Inductively Coupled Plasma Source for Application to Narrow Gap Plasma Processes

Kim, Dae Woong; You, Shin Jae; Kim, Jung Hyun; Chang, Hongyoung; Oh, Wang-Yuhl, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.43, no.11, pp.3876 - 3882, 2015-11

2
Effect of mixing CF4 with O-2 on electron characteristics of capacitively coupled plasma

Seol, Youbin; Chang, Hong Young; Ahn, Seung Kyu; You, Shin Jae, PHYSICS OF PLASMAS, v.30, no.1, 2023-01

3
Study on characteristics of electron parameters on inert gas addition in a capacitively coupled SF6/O-2 plasma

Seol, Youbin; Chang, Hong Young; Ahn, Seung Kyu; You, Shin Jae, AIP ADVANCES, v.12, no.12, 2022-12

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