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Characteristics of an inductively coupled plasma source using a parallel resonance antenna Lee, Dongseok; Lee, YK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.701 - 706, 2004-11 |
On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06 |
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