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Showing results 1 to 8 of 8

1
A study on low dielectric material deposition using a helicon plasma source

Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09

2
Antifungal activities of recombinant antifungal protein by conjugation with polyethylene glycol

Lee, KM; Kim, DH; Lee, Younghoon; Choi, Byong-Seok; Chung, JH; Lee, BL, MOLECULES AND CELLS, v.9, no.4, pp.410 - 416, 1999-08

3
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition

Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; et al, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05

4
Novel simulation model for perpendicular magnetic recording

Lee, KJ; Im, YH; Kim, YS; Lee, KM; Kim, JW; Park, NY; Park, GS; et al, JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.235, pp.398 - 402, 2001-10

5
Recording physics of perpendicular recording with single layered medium and ring head

Lee, Kyung-Jin; Kim, YS; Kim, ES; Im, YH; Lee, KM; Kim, JW; Lee, BK; et al, JOURNAL OF APPLIED PHYSICS, v.91, no.10, pp.8700 - 8702, 2002-05

6
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source

Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07

7
The deposition of SiOF film with low dielectric constant in a helicon plasma source

Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996

8
The deposition of SiOF film with low dielectric constant in a helicon plasma source

Kim, JH; See, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, APPLIED PHYSICS LETTERS, v.68, no.11, pp.1507 - 1509, 1996-03

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