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Showing results 1 to 4 of 4

1
Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists

Kim, Jin-Baek; Ko, JS; Jang, JH; Choi, JH; Lee, BW, POLYMER JOURNAL, v.36, no.1, pp.18 - 22, 2004

2
Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithography

Kim, Jin-Baek; Jang, JH; Ko, JS; Choi, JH; Lee, KK, MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882, 2003-10

3
Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)]

Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07

4
Synthesis of a novel methacrylate, (1,4-dioxa-8-methacrylate amide spiro [4,5] decane) monomer and its co-polymerization with t-butyl-3 alpha-methacryloxy-7 alpha, 12 alpha-dihydroxy-5 beta cholan-24-oate for 193 nm photoresist

Karak, N; Ko, JS; Kim, Jin-Baek, JOURNAL OF POLYMER MATERIALS, v.19, pp.365 - 372, 2002-12

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