Showing results 3 to 9 of 9
Effects of substrate bias on electron energy distribution in magnetron sputtering system Seo, Sang-Hun; In, Jung-Hwan; Chang, Hong-Young; Han, Jeon-Geon, PHYSICS OF PLASMAS, v.11, no.10, pp.4796 - 4800, 2004-10 |
Fast measurement of a pulsed plasma using a Fourier cutoff probe Na, Byung-Keun; You, Kwang-Ho; Kim, D. -W.; Seo, Byong-Hoon; Chang, Hong-Young; You, S. -J.; Lee, Yun-Seong, JOURNAL OF INSTRUMENTATION, v.7, 2012-04 |
IN-SITU MONITORING OF THE RELATIVE DISTRIBUTION OF RADICALS BY A 2-PROBE SYSTEM LEE, PW; KIM, YJ; CHANG, CS; Chang, Hong-Young; MOON, J, REVIEW OF SCIENTIFIC INSTRUMENTS, v.66, no.9, pp.4591 - 4594, 1995-09 |
Numerical study of the plasma wall-bias effect on the ion flux through acceleration grid hole Park, Seung-Hoon; Chang, Choong-Seock, PHYSICS OF PLASMAS, v.17, no.7, pp.073505, 2010-07 |
On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08 |
Research of non-uniformity in 450 mm multi-electrode capacitive coupled plasma Park, Gi Jung; Lee, Yoon Seong; Seo, Sang Hoon; Chung, Chin Wook; Chang, Hong-Young, THIN SOLID FILMS, v.547, pp.293 - 298, 2013-11 |
Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature Song, Hohyun; Seo, Sang Hun; Chang, Hongyoung, CURRENT APPLIED PHYSICS, v.18, no.11, pp.1436 - 1440, 2018-11 |
Discover