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Synthesis and application of polymers for 193-nm photoresists = 193-nm 포토레지스트용 고분자의 합성 및 응용link Lee, Jae-Jun; 이재준; et al, 한국과학기술원, 2002 |
Synthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists Kim, Jin-Baek; Lee, JJ, POLYMER, v.43, no.6, pp.1963 - 1967, 2002-03 |
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