DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Jang, JH | ko |
dc.contributor.author | Ko, JS | ko |
dc.contributor.author | Choi, JH | ko |
dc.contributor.author | Lee, KK | ko |
dc.date.accessioned | 2009-09-02T05:18:03Z | - |
dc.date.available | 2009-09-02T05:18:03Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-10 | - |
dc.identifier.citation | MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882 | - |
dc.identifier.issn | 1022-1336 | - |
dc.identifier.uri | http://hdl.handle.net/10203/10933 | - |
dc.description.abstract | Novel water-developable negative resists were designed to induce both crosslinking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced crosslinking , polarity change, and an increase in dry-etch resistance. The resist formulated with this polymer and cast in a water/ethanol mixture showed 0.7 mum line and space patterns using a mercury-xenon lamp in a contact printing mode and pure water as a developer. | - |
dc.description.sponsorship | KAIST BK21 | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | PHOTO-CROSS-LINKING | - |
dc.subject | IMPACT | - |
dc.subject | PHOTORESISTS | - |
dc.subject | POLYMERS | - |
dc.subject | DESIGN | - |
dc.title | Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000186391700002 | - |
dc.identifier.scopusid | 2-s2.0-0242443875 | - |
dc.type.rims | ART | - |
dc.citation.volume | 24 | - |
dc.citation.issue | 15 | - |
dc.citation.beginningpage | 879 | - |
dc.citation.endingpage | 882 | - |
dc.citation.publicationname | MACROMOLECULAR RAPID COMMUNICATIONS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Jang, JH | - |
dc.contributor.nonIdAuthor | Ko, JS | - |
dc.contributor.nonIdAuthor | Choi, JH | - |
dc.contributor.nonIdAuthor | Lee, KK | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | crosslinking | - |
dc.subject.keywordAuthor | photoresists | - |
dc.subject.keywordAuthor | water-soluble polymers | - |
dc.subject.keywordPlus | PHOTO-CROSS-LINKING | - |
dc.subject.keywordPlus | IMPACT | - |
dc.subject.keywordPlus | PHOTORESISTS | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | DESIGN | - |
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