An Investigation on the Resistivity Abnormaly Phenomenon in highly Boron-doped Cz Silicon Substrate during NMOS Simulation and High Temperature Annealing

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dc.contributor.authorLee, JeongYongko
dc.date.accessioned2013-03-14T12:36:31Z-
dc.date.available2013-03-14T12:36:31Z-
dc.date.created2012-02-06-
dc.date.issued1994-05-
dc.identifier.citationSan Francisco Meeting of the Electrochemical Society, pp.22 - 27-
dc.identifier.urihttp://hdl.handle.net/10203/108771-
dc.languageEnglish-
dc.publisherElectrochemical Society-
dc.titleAn Investigation on the Resistivity Abnormaly Phenomenon in highly Boron-doped Cz Silicon Substrate during NMOS Simulation and High Temperature Annealing-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage22-
dc.citation.endingpage27-
dc.citation.publicationnameSan Francisco Meeting of the Electrochemical Society-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Francisco, CA-
dc.contributor.localauthorLee, JeongYong-
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MS-Conference Papers(학술회의논문)
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