DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoo, Han G. | ko |
dc.contributor.author | Fu, Yijing | ko |
dc.contributor.author | Riley, Daniel | ko |
dc.contributor.author | Shin, JungHoon | ko |
dc.contributor.author | Fauchet, Philippe M. | ko |
dc.date.accessioned | 2009-08-28T08:05:10Z | - |
dc.date.available | 2009-08-28T08:05:10Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2008-06 | - |
dc.identifier.citation | OPTICS EXPRESS, v.16, no.12, pp.8623 - 8628 | - |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | http://hdl.handle.net/10203/10855 | - |
dc.description.abstract | Through simulations and measurements, we show that in multi-slot thin film waveguides, the TM polarized modes can be confined mostly in the low refractive index layers of the waveguide. The structure consisted of alternating layers of a-Si and SiO2, in the thickness range between 3 and 40 nm, for which the slots were the SiO2 layers. Simulations were performed using the transfer matrix method and experiments using the m-line technique at 1.55 mu m. The dependence of the birefringence and of the power confinement in the slots was studied as a function of the waveguide thickness, the Si and SiO2 layer thicknesses, and the SiO2/Si layer thickness ratio. We find a large birefringence - a refractive index difference between TE and TM modes - as large as 0.8. For TM polarized modes, up to similar to 85% of the total power in the fundamental mode can be confined in the slots. (c) 2008 Optical Society of America. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | OPTICAL SOC AMER | - |
dc.subject | NANOCRYSTALLINE-SILICON | - |
dc.subject | CONFINING LIGHT | - |
dc.subject | FILMS | - |
dc.subject | NM | - |
dc.title | Birefringence and optical power confinement in horizontal multi-slot waveguides made of Si and SiO2 | - |
dc.type | Article | - |
dc.identifier.wosid | 000256859900030 | - |
dc.identifier.scopusid | 2-s2.0-45249101070 | - |
dc.type.rims | ART | - |
dc.citation.volume | 16 | - |
dc.citation.issue | 12 | - |
dc.citation.beginningpage | 8623 | - |
dc.citation.endingpage | 8628 | - |
dc.citation.publicationname | OPTICS EXPRESS | - |
dc.identifier.doi | 10.1364/OE.16.008623 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Shin, JungHoon | - |
dc.contributor.nonIdAuthor | Yoo, Han G. | - |
dc.contributor.nonIdAuthor | Fu, Yijing | - |
dc.contributor.nonIdAuthor | Riley, Daniel | - |
dc.contributor.nonIdAuthor | Fauchet, Philippe M. | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | NANOCRYSTALLINE-SILICON | - |
dc.subject.keywordPlus | CONFINING LIGHT | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | NM | - |
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