Interpretation of rapid thermal diffusion of phosphorus into siliconInterpretation of rapid thermal diffusion of phosphorus into silicon
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 조병진 | - |
| dc.contributor.author | Kim, CK | - |
| dc.date.accessioned | 2013-03-14T12:10:42Z | - |
| dc.date.available | 2013-03-14T12:10:42Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991-03-05 | - |
| dc.identifier.citation | Semiconductor Workshop for Young Engineers, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/108538 | - |
| dc.language | KOR | - |
| dc.title | Interpretation of rapid thermal diffusion of phosphorus into silicon | - |
| dc.title.alternative | Interpretation of rapid thermal diffusion of phosphorus into silicon | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | Semiconductor Workshop for Young Engineers | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 조병진 | - |
| dc.contributor.nonIdAuthor | Kim, CK | - |
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