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College of Engineering(공과대학)Dept. of Chemical and Biomolecular Engineering(생명화학공학과)CBE-Conference Papers(학술회의논문)

New-Fine patterning method of positive photoresist by silylation/ wet develop

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dc.contributor.author김주태-
dc.contributor.author장태호-
dc.contributor.author김현배-
dc.contributor.author김남윤-
dc.contributor.author박희균-
dc.contributor.author우성일-
dc.date.accessioned2013-03-14T08:36:40Z-
dc.date.available2013-03-14T08:36:40Z-
dc.date.created2012-02-06-
dc.date.issued1993-01-
dc.identifier.citationConf. on Semiconductor Materials, Components and Computer Aided Design, Spring Symp., KITE, v.11, no.1, pp.293 - 296-
dc.identifier.urihttp://hdl.handle.net/10203/107070-
dc.languageENG-
dc.publisher대한전자공학회-
dc.titleNew-Fine patterning method of positive photoresist by silylation/ wet develop-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.volume11-
dc.citation.issue1-
dc.citation.beginningpage293-
dc.citation.endingpage296-
dc.citation.publicationnameConf. on Semiconductor Materials, Components and Computer Aided Design, Spring Symp., KITE-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor우성일-
dc.contributor.nonIdAuthor김주태-
dc.contributor.nonIdAuthor장태호-
dc.contributor.nonIdAuthor김현배-
dc.contributor.nonIdAuthor김남윤-
dc.contributor.nonIdAuthor박희균-
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CBE-Conference Papers(학술회의논문)
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