Characterization of TiO2 thin film prepared by plasma enhanced chemical vapor deposition

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dc.contributor.authorLee, WK-
dc.contributor.authorWoo, Seong-Ihl-
dc.date.accessioned2013-03-14T06:56:00Z-
dc.date.available2013-03-14T06:56:00Z-
dc.date.created2012-02-06-
dc.date.issued1992-
dc.identifier.citationKorea Vacuum Society Winter Symposium, v., no., pp.52 --
dc.identifier.urihttp://hdl.handle.net/10203/106325-
dc.languageENG-
dc.publisherKorea Vacuum Society-
dc.titleCharacterization of TiO2 thin film prepared by plasma enhanced chemical vapor deposition-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage52-
dc.citation.publicationnameKorea Vacuum Society Winter Symposium-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorWoo, Seong-Ihl-
dc.contributor.nonIdAuthorLee, WK-
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CBE-Conference Papers(학술회의논문)
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