DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Ji Young | ko |
dc.contributor.author | Kim, Myung Gi | ko |
dc.contributor.author | Kim, Jin-Baek | ko |
dc.date.accessioned | 2009-08-18T02:41:20Z | - |
dc.date.available | 2009-08-18T02:41:20Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2008-09 | - |
dc.identifier.citation | MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.18, pp.1532 - 1537 | - |
dc.identifier.issn | 1022-1336 | - |
dc.identifier.uri | http://hdl.handle.net/10203/10587 | - |
dc.description.abstract | A novel silicon-containing molecular resist material based on polyhedral oligomeric silsesquioxane, possessing trimethoxysilyl groups, was designed in order to reduce post-exposure delay problems and to improve resolution. Since the acid-catalyzed cross-linking reaction of trimethoxysilyl groups occurs at room temperature, there is no necessity of post-exposure bake. The molecular resist showed 0.7 mu m line-and-space patterns using a mercury-xenon lamp in a contact printing mode and 100 nm line-and-space patterns using electron beam lithography. | - |
dc.description.sponsorship | BK21 project | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | HIGH-RESOLUTION | - |
dc.subject | NANOMETER LITHOGRAPHY | - |
dc.subject | ORGANIC RESISTS | - |
dc.subject | NM LITHOGRAPHY | - |
dc.subject | MICROLITHOGRAPHY | - |
dc.subject | PHOTORESISTS | - |
dc.subject | COPOLYMERS | - |
dc.subject | DENDRIMER | - |
dc.subject | ACRYLATE | - |
dc.title | Room temperature processable silicon-containing molecular resist | - |
dc.type | Article | - |
dc.identifier.wosid | 000259651700006 | - |
dc.identifier.scopusid | 2-s2.0-54949107758 | - |
dc.type.rims | ART | - |
dc.citation.volume | 29 | - |
dc.citation.issue | 18 | - |
dc.citation.beginningpage | 1532 | - |
dc.citation.endingpage | 1537 | - |
dc.citation.publicationname | MACROMOLECULAR RAPID COMMUNICATIONS | - |
dc.identifier.doi | 10.1002/marc.200800324 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Kim, Myung Gi | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | electron beam | - |
dc.subject.keywordAuthor | photoresist | - |
dc.subject.keywordAuthor | polyhedral oligomeric silsesquioxane | - |
dc.subject.keywordAuthor | trimethoxysilane | - |
dc.subject.keywordPlus | HIGH-RESOLUTION | - |
dc.subject.keywordPlus | NANOMETER LITHOGRAPHY | - |
dc.subject.keywordPlus | ORGANIC RESISTS | - |
dc.subject.keywordPlus | NM LITHOGRAPHY | - |
dc.subject.keywordPlus | MICROLITHOGRAPHY | - |
dc.subject.keywordPlus | PHOTORESISTS | - |
dc.subject.keywordPlus | COPOLYMERS | - |
dc.subject.keywordPlus | DENDRIMER | - |
dc.subject.keywordPlus | ACRYLATE | - |
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