Characterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reactive Ion Etching
- Issue Date
- 1990-12-01
- Language
- ENG
- Citation
Materials Research Society, pp.431 - 431
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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