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Effect of degree of coherence in optical lithography using dummy diffraction mask Yim, D; Lee, S; Lee, S; Oh, YH; Chung, HB; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.2A, pp.780 - 785, 1996-02 |
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