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Highly robust SiCOH/mesoporous SiO2 ultralow dielectric films with heterostructures

Park, Jong-Min; Kim, Kyoung Hwan; An, Chengjin; Jin, Mingliang; Hahn, Jun-Hee; Kong, Byung-Seon; Jung, HeeTae, RSC ADVANCES, v.4, no.54, pp.28409 - 28416, 2014-04

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