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Showing results 1 to 12 of 12

1
Diode laser-induced fluorescence measurements of metastable argon ions in a magnetized inductively coupled plasma

Jun, S; Chang, Hong-Young; McWilliams, R, PHYSICS OF PLASMAS, v.13, pp.122 - 123, 2006-05

2
Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4 Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System

Jang, SS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.40, no.8, pp.4819 - 4824, 2001-08

3
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09

4
Efficient Suppression of Defects and Charge Trapping in High Density In-Sn-Zn-O Thin Film Transistor Prepared using Microwave-Assisted Sputter

Goh, Youngin; Ahn, Jaehan; Lee, Jeong Rak; Park, Wan Woo; Park, Sang-Hee Ko; Jeon, Sanghun, ACS APPLIED MATERIALS & INTERFACES, v.9, no.42, pp.36962 - 36970, 2017-10

5
Electron temperature control with a small mesh number grid in inductively coupled plasmas

Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11

6
Electron temperature control with grid bias in inductively coupled argon plasma

Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03

7
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma

Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06

8
ONE-DIMENSIONAL FLUID MODEL OF ECR DISCHARGE WITH INHOMOGENEITY EFFECTS OF EXTERNAL MAGNETIC-FIELD

YOON, NS; CHOI, NH; PARK, HB; Choi, Duk In, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.23, no.4, pp.609 - 616, 1995-08

9
Plasma parameters analysis of various mixed gas inductively coupled plasmas

Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06

10
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07

11
Study of shallow silicon trench etch process using planar inductively coupled plasmas

Lee, JH; Yeom, GY; Lee, JW; Lee, JeongYong, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.15, no.3, pp.573 - 578, 1997-12

12
The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature

Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03

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