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Showing results 1 to 3 of 3

1
Negative bias temperature instability on plasma-nitrided silicon dioxide film

Ang, CH; Lek, CM; Tan, SS; Cho, Byung Jin; Chen, TP; Lin, WH; Zhen, JZ, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.41, no.3B, pp.314 - 316, 2002-03

2
Reduction of radiation-induced leakage currents in thin oxides by application of a low post-irradiation gate bias

Ang, CH; Ling, CH; Cheng, ZY; Kim, SJ; Cho, Byung Jin, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.39, no.7B, pp.757 - 759, 2000-07

3
Short-Channel Effects in n- and p-Channel Polycrystalline silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N2O- Plasma Gate Dielectric

J-W Lee; N-I Lee; C-H Han, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, v.37, no.3B, pp.1047 - 1049, 1998-01

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