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Effect of the deposition geometry on the electrical properties within Tin-doped indium oxide film deposited under a given RF magnetron sputtering condition You, DJ; Choi, Si-Kyung; Han, HS; Lee, JS; Lim, CB, THIN SOLID FILMS, v.401, no.1-2, pp.229 - 234, 2001-12 |
Influence of film density on residual stress and resistivity for Cu thin films deposited by bias sputtering Choi, HM; Choi, Si-Kyung; Anderson, O; Bange, K, THIN SOLID FILMS, v.358, no.1-2, pp.202 - 205, 2000-01 |
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