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Optical properties of Si-O-N-F films as a phase shift mask material for 157 nm optical lithography Kim, SK; Kang, MA; Sohn, JM; Kim, SH; No, Kwangsoo, OPTICAL MATERIALS, v.22, no.4, pp.361 - 367, 2003-06 |
Simultaneous measurements of atmospheric pollutants and visibility with a long-path DOAS system in urban areas Lee J.S.; Kim Y.J.; Kuk B.; Geyer A.; Platt U., ENVIRONMENTAL MONITORING AND ASSESSMENT, v.104, no.1-3, pp.281 - 293, 2005-05 |
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