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Direct electron-beam writing with high aspect ratio for fabricating ion-beam lithography mask Lee, BN; Cho, Yong-Hoon; Kim, YS; Hong, W; Woo, HJ, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, pp.S199 - S201, 2003-02 |
Investigation of reliability degradation of ultra-thin gate oxides irradiated under electron-beam lithography conditions Chong, PF; Cho, Byung Jin; Chor, EF; Joo, MS; Yeo, IS, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.39, no.4B, pp.2181 - 2185, 2000-04 |
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