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Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)(2) precursor Tian, HY; Chan, HLW; Choy, CL; Choi, JW; No, Kwangsoo, MATERIALS CHEMISTRY AND PHYSICS, v.93, pp.142 - 148, 2005-09 |
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