Showing results 1 to 2 of 2
Dry etching characteristics of Pb(ZrTi)O-3 films in CF4 and Cl-2/CF4 inductively coupled plasmas Jung, JK; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.3A, pp.1408 - 1419, 2001-03 |
전자 싸이클로트론 공명 플라즈마 식각장치내에서 $SF_6$ 방전시 생성된 F 활성원자의 분포특성 연구 = Study on the characteristics of F radical atoms created from the $SF_6$ discharge in ECR plasma etcherlink 김용진; Kim, Yong-Jin; et al, 한국과학기술원, 1995 |
Discover