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Showing results 1 to 5 of 5

1
Correlation between excitation temperature and electron temperature with two groups of electron energy distributions

Park, Hoyong; You, S. J.; Choe, Wonho, PHYSICS OF PLASMAS, v.17, 2010-10

2
Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, Ho Jin; Kim, SH; Hong, Soon-Hyung, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.277, no.1-2, pp.57 - 63, 2000-01

3
In situ diagnosis of chemical species for the growth of carbon nanotubes in microwave plasma-enhanced chemical vapor deposition

Woo, YS; Jeon, DukYoung; Han, IT; Lee, NS; Jung, JE; Kim, JM, DIAMOND AND RELATED MATERIALS, v.11, no.1, pp.59 - 66, 2002-01

4
IN-SITU MONITORING OF THE RELATIVE DISTRIBUTION OF RADICALS BY A 2-PROBE SYSTEM

LEE, PW; KIM, YJ; CHANG, CS; Chang, Hong-Young; MOON, J, REVIEW OF SCIENTIFIC INSTRUMENTS, v.66, no.9, pp.4591 - 4594, 1995-09

5
Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2

Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05

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