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A high performance MIM capacitor using HfO(2) dielectrics Hu, H; Zhu, CX; Lu, YF; Li, MF; Cho, Byung Jin; Choi, WK, IEEE ELECTRON DEVICE LETTERS, v.23, no.9, pp.514 - 516, 2002-09 |
Atomic layer deposited high-kappa films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications Zhu, CX; Cho, Byung Jin; Li, MF, CHEMICAL VAPOR DEPOSITION, v.12, no.2-3, pp.165 - 171, 2006-03 |
RF Modeling of and MOS Varactor and MIM Capacitor in 0.18mm CMOS Technology Song, Seong-Sik; Han, Jeonghu; Je, Minkyu; Han, Kwangseok; Shin, Hyung-Cheol, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.6, pp.922 - 926, 2002-12 |
RPCVD에 의해 증착된 $Si_3N_4/SiO_2/SiON$ 박막들의 MMIC\&OEIC 응용에 관한 연구 = Study for the application of $Si_3N_4/SiO_2/SiON$ films deposited by RPCVD to MMIC\&OEIClink 이종주; Lee, Jong-Joo; et al, 한국과학기술원, 1997 |
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